Semiconductor Manufacturing Equipment
TIGRIS® Batch Type Wet Station
Batch Type Wet Station TIGRIS®200/TIGRIS®300 can be used for 200mm/300mm wafer, both for Cleaning and Etching. Not only applied to world wide standard specification, but also added our original technologies. By using monitoring system, TIGRIS® achieve high process performance. Also customer can add H3PO4 reclaim system PSYRION® or H3PO4 circulation system NISON® 1800 as option.
High wph transfer system
###High process performance by chemical control with monitoring system
###Can add H3PO4 recycle system PSYRION® or H3PO4 circulation system NISON® 1800 for ECO and chemical usage reduction.
###Flexible configuration by combining process module
User friendly interface
- Substrate sizes
- 200 mm / 300 mm wafer
Sales Div.Apprecia Business Unit