PRODUCTS

Semiconductor Manufacturing Equipment

Cleaning SystemsTIGRIS®

バッチ式浸漬洗浄・エッチングシステム
TIGRIS® Batch Type Wet Station

Batch Type Wet Station TIGRIS®200/TIGRIS®300 can be used for 200mm/300mm wafer, both for Cleaning and Etching. Not only applied to world wide standard specification, but also added our original technologies. By using monitoring system, TIGRIS® achieve high process performance. Also customer can add H3PO4 reclaim system PSYRION® or H3PO4 circulation system NISON® 1800 as option.

Features

Platform

High wph transfer system

Process Unit

###High process performance by chemical control with monitoring system

###Can add H3PO4 recycle system PSYRION® or H3PO4 circulation system NISON® 1800 for ECO and chemical usage reduction.

###Flexible configuration by combining process module

Operability

User friendly interface

Specification

Substrate sizes
200 mm / 300 mm wafer
mla-sag@tazmo.co.jp

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Sales Div.Apprecia Business Unit

(03)6892-5123

(03)6233-9730

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